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UV AOP

UV-AOP (Ultraviolet-Advanced Oxidation Process)

  • Process of removing organic chemicals and pollutants through hydroxyl radical produced by oxidant and UV
  • Normally, disinfect microorganisms in water such as Cryptosporidium, which is resistant to chlorination via UV radiation
  • In the event of contamination, Advanced Oxidation Mode is activated and oxidant is added to remove the contamination
  • Reduction of operating costs through the combined operation of disinfection and AOP
  • Remove taste & odor causing substances
  • Remove organic contamination in industrial waste
  • Applicable to Direct Potable Reuse (DPR) process that recycles reuse water to portable Water

AOP (Advanced Oxidation Process) Principle

Hydrogen Peroxide Photolysis Steps

1step. Hydrogen peroxide dissolve in water
2step. Hydrogen peroxide absorb Ultraviolet light
3step. Highly reactive high energy hydroxyl radicals are formed

Total Decomposition Step into Inorganic Residues

4step. Hydroxyl radicals attack the contaminants
5step. Photolysis occur simultaneously
6step. Hydroxyl radical decompose contaminants
*Reaction Completion : Contaminants are decomposed into CO2 and H2O

Type of Taste and Odor Problems

Taste and Odor Source
Soil Geosmin
Mold MIB, Isopropyl methoxy pyrazine(IPMP), Isobutyl-methoxypyrazine(IBMP)
Turpentine, Oil Methyl tert-butyl ether(MTBE)
Rotten, Fishy 2, 4-Heptadienal, Decadienal, Octanal
Chlorine Chlorine
Chemical Chlorophenols, Iodoform
Oil and Paint Hydrocarbons, Volatle organic compounds (VOCs)
Metal Iron, Copper, Zinc, Manganese

Advanced Water Treatment Tech. Comparison

Method Contaminants* By-product
/ Hazardous Material
Waste Initial Cost / Maintenance and Operational Cost**
NDMA and
1,4Dioxane
Pesticides VOCs Taste
&Odor
MTBE Environmental Hormones Disinfection
UVPhotolysys and UVOxidation 000 000 00 000 00 00 00 Minimum Annual Lamp Replacements \\/\\
Ozone   000 00 000 0 00 00 Bromate Carcinogen Ozone Gas Treatment \\\/\\\
Membrane Separation(RO)   00 00 0 0 000 0 Contaminated Waste / Brine Concentrate Treatment of 20% Concentrated Brine of the inflow \\\/\\
Activated Carbon Absorption   000 000 00 00 00   Contaminated Activated Carbon Waste Disposal or Regeneration of the contaminants adsorbed Actived Carbone Waste \/\\
Air Stripping   00 000   0     Contaminated Exhaust Gas The Vaporized Contaminants (requiring additional waste treatment facility) \/\

* More “O” means better at removing contaminants ** More “$” means more expensive

CFD Modeling

CFD analysis to predict oxidation reagent mixing, UV intensity, and performance of medium pressure UV system

CFD analysis to predict oxidation reagent mixing, UV intensity, and performance of low pressure UV system

Low Pressure UV-AOP

Low Pressure UV AOP system

  • Durable and energy efficient UV SolarRay Technology that can reduce maintenance cost
  • Irradiation of 254nm monochromatic UV-C to increase disinfection and oxidation efficiency
  • Expandable modular design
  • Proven performance by CFD-RED analysis and extensive field tests
  • Algorithm that automatically adjusts system based on flow rate and water quality (optional)
  • Maintain performance efficiency via automatic mechanical cleaning system (option: Online-Mechanical-Chemical-Cleaning)
  • Remove taste and odor causing substance (ex. 2-MIB, Geosmin) and nonbiodegradable substance

Standard Specification

Model Specification  
Material StSt 316, Electropolishing and acid treatment
Lamp Type/Input power per lamp LP UV Lamp / 320W~1000W
Cleaning System Electric Motor-driven Automatic Wiper Mechanism
Operating Temperature 5℃~65℃
Connection P16, DN, ANSI150, JIS, KS
Working / Max Operating Pressure 10bar / 15bar
Enclosure Specification  
Material RAL 7032, Mild steel (Optional StSt 304 available)
Protection Rating IP54 / NEMA 4X
System Control Panel (SCP)  
Controller PLC
Voltage / Frequency 220V~480V / 50/60Hz
Operating Temperature 0℃~50℃
Power Supply Panel (PSP)  
Ballast Type Variable output electronic ballast

System Layout

ddd.jpg

Medium Pressure UV-AOP

Medium Pressure UV AOP

  • High output medium pressure UV lamp reduces number of lamps needed in a reactor.
  • Fewer lamps per reactor provides the ease of maintenance.
  • 70% less footprint than LP UV system.
  • Easy expansion and installation depending on the flange type.
  • Proven performance by CFD-RED analysis and extensive field tests.
  • Algorithm that automatically adjusts system based on flow rate and water quality (optional).
  • Superior UV intensity and broader UV wavelength than low pressure lamp.
  • Lower initial investment cost than LP UV system with similar specification.
  • Maintain performance efficiency via automatic mechanical cleaning system (option:Online-Mechanical-Chemical-Cleaning)
  • Installation of baffle through CFD analysis to stabilize flow in reactor
  • Remove taste and odor causing substance (ex. 2-MIB, Geosmin) and nonbiodegradable substance

Standard Specification

Module Specification  
Material StSt 316, Electropolishing and acid treatment
Lamp Type/Input power per lamp MP UV Lamp / 0.5kW~24kW
Cleaning System Electric Motor-driven Automatic Wiper Mechanism
Operating Temperature 5℃~65℃
Connection P16, DN, ANSI150, JIS, KS
Working / Max Operating Pressure 10bar / 15bar
Enclosure Specification  
Material RAL 7032, Mild steel (Optional StSt 304 available)
Protection Rating IP54 / NEMA 4X
System Control Panel (SCP)  
Controller PLC
Voltage / Frequency 220V~480V / 50/60Hz
Operating Temperature 0℃~50℃
Power Supply Panel (PSP)  
Ballast Type Variable output electronic ballast

System Layout

ddd2.jpg

Gallary

C. Water Treatment Facility (LP UV System)

 

N. Potable Water Treatment Facility (First in Korea) – LP UV System

 

D. Cluster (MP UV System)

 

N. Water Treatment Facility (MP / LP UV System)
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